发明名称 |
LIQUID PHASE MOLECULAR SELF-ASSEMBLY FOR BARRIER DEPOSITION AND STRUCTURES FORMED THEREBY |
摘要 |
Methods and associated structures of forming a microelectronic structure are described. Those methods may comprise dissolving a metal precursor in a non-aqueous solvent in a bath; placing a substrate comprising an interconnect opening in the bath, wherein the metal precursor forms a monolayer within the interconnect opening; and placing the substrate in a coreactant mixture, wherein the coreactant reacts with the metal precursor to form a thin barrier monolayer. |
申请公布号 |
WO2010008703(A2) |
申请公布日期 |
2010.01.21 |
申请号 |
WO2009US46681 |
申请日期 |
2009.06.09 |
申请人 |
INTEL CORPORATION;LAVOIE, ADRIEN, R. |
发明人 |
LAVOIE, ADRIEN, R. |
分类号 |
H01L21/208;H01L21/288 |
主分类号 |
H01L21/208 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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