发明名称 HETERO JUNCTION FIELD EFFECT TRANSISTOR AND METHOD OF FABRICATING THE SAME
摘要 There is provided a hetero junction field effect transistor including: a first layer of a nitride based, group III-V compound semiconductor; a second layer of a nitride based, group III-V compound semiconductor containing a rare earth element, overlying the first layer; a pair of third layers of a nitride based, group III-V compound semiconductor, overlying the second layer, the third layers being spaced from each other; a gate electrode disposed between the third layers at least a region of the second layer; and a source electrode overlying one of the third layers and a drain electrode overlying an other of the third layers. A method of fabricating the hetero junction field effect transistor is also provided.
申请公布号 US2010012924(A1) 申请公布日期 2010.01.21
申请号 US20090507604 申请日期 2009.07.22
申请人 TERAGUCHI NOBUAKI 发明人 TERAGUCHI NOBUAKI
分类号 H01L29/772 主分类号 H01L29/772
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