发明名称 |
VERFAHREN UND ANORDNUNG ZUM ENTFERNEN VON VERUNREINIGUNGEN VON EINER SUBSTRATOBERFLÄCHE UNTER VERWENDUNG EINES ATMOSPHÄRENDRUCK-GLÜHPLASMAS |
摘要 |
The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented. |
申请公布号 |
DE602004024576(D1) |
申请公布日期 |
2010.01.21 |
申请号 |
DE20046024576T |
申请日期 |
2004.12.22 |
申请人 |
FUJIFILM MANUFACTURING EUROPE B.V. |
发明人 |
DE VRIES, HINDRIK WILLEM;ALDEA, EUGEN;BOUWSTRA, JAN BASTIAAN;VAN DE SANDEN, MAURITIUS CORNELIUS |
分类号 |
H01J37/32;H01L51/52;H05H1/24 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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