发明名称 VERFAHREN UND ANORDNUNG ZUM ENTFERNEN VON VERUNREINIGUNGEN VON EINER SUBSTRATOBERFLÄCHE UNTER VERWENDUNG EINES ATMOSPHÄRENDRUCK-GLÜHPLASMAS
摘要 The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
申请公布号 DE602004024576(D1) 申请公布日期 2010.01.21
申请号 DE20046024576T 申请日期 2004.12.22
申请人 FUJIFILM MANUFACTURING EUROPE B.V. 发明人 DE VRIES, HINDRIK WILLEM;ALDEA, EUGEN;BOUWSTRA, JAN BASTIAAN;VAN DE SANDEN, MAURITIUS CORNELIUS
分类号 H01J37/32;H01L51/52;H05H1/24 主分类号 H01J37/32
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