| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern generator device for solving a problem of stitching errors. <P>SOLUTION: In the device, at least two adjacent joined partial images overlap at a common boundary; and each of the overlapped partial images has an essentially the same pattern and reduced exposure dose in an overlap area. The reduced exposure dose in the overlap area is made by an analog function of a phase modulation analog space light modulation device using performance of a phase modulation element which sets to an intermediate modulation state between an on state and an off state. Complex amplitude of light in which complex amplitude of light reflected from a microscopic region of the phase modulation element that is set to the intermediate modulation state makes the reduced exposure dose in the overlap area. <P>COPYRIGHT: (C)2010,JPO&INPIT |
