发明名称 SUBSTRATE PROCESSING METHOD, DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem of substrate processing methods in the prior art having difficulty forming a plurality of films over one another in such a way as to form each film throughout the inside of an area surrounded by barrier ribs. Ž<P>SOLUTION: A substrate processing method has, in that order, a step of preparing a substrate 41a provided with an insulating film 63 in such a way as to define a pixel formation area on a planar view; a lyophilic processing step of providing at least a portion of the insulating film 63 with a greater lyophilic property than the lyophilic property of the insulating film 63 toward a first liquefied body; a repellent processing step of providing a portion of the insulating film 63 with liquid repellency so that the portion has a greater liquid repellency toward the first liquefied body than the insulating film 63 made lyophilic toward the first liquefied body; and a heating step of heating the substrate 41a. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010015855(A) 申请公布日期 2010.01.21
申请号 JP20080175346 申请日期 2008.07.04
申请人 SEIKO EPSON CORP 发明人 YANAGIHARA HIROKAZU
分类号 H05B33/10;G09F9/00;G09F9/30;H01L27/32;H01L51/50;H05B33/02;H05B33/12;H05B33/22 主分类号 H05B33/10
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