发明名称 |
SYSTEM AND METHOD OF CONTROLLING BROAD BEAM UNIFORMITY |
摘要 |
An ion beam uniformity control system, wherein the uniformity control system comprising a differential pumping chamber that encloses an array of individually controlled gas jets, wherein the gas pressure of the individually controlled gas jets are powered by a controller to change the fraction of charge exchanged ions, and wherein the charge exchange reactions between the gas and ions change the fraction of the ions with original charge state of a broad ion beam, wherein the charge exchanged portion of the broad ion beam is removed utilizing an deflector that generates a magnetic field, a Faraday cup profiler for measuring the broad ion beam profile; and adjusting the individually controlled gas jets based upon feedback provided to the controller to obtain the desired broad ion beam. |
申请公布号 |
WO2010008469(A2) |
申请公布日期 |
2010.01.21 |
申请号 |
WO2009US03742 |
申请日期 |
2009.06.23 |
申请人 |
AXCELIS TECHNOLOGIES, INC.;SATOH, SHU;SIERADSKI, MANNY;EISNER, EDWARD |
发明人 |
SATOH, SHU;SIERADSKI, MANNY;EISNER, EDWARD |
分类号 |
H01J27/02;H01J27/00 |
主分类号 |
H01J27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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