| 摘要 |
<p>Disclosed is a method for modifying a first film by using a second film. Particularly disclosed is a method for modifying a first film wherein a pattern can be formed by using a conventional photolithographic process even when the first film to be formed into the pattern contains no acid generator. A composition for forming an acid transfer resin film which is used in the method is also disclosed. The modification method comprises, in the following order, a step (I) of forming a second film (20) containing an acid generator on a first film (10) having an acid-cleavable group, a step (II) of generating an acid by exposing the second film (20) through a mask (30), a step (III) of transferring the acid generated in the second film (20) to the first film (10), and a step (IV) of removing the second film (20).</p> |
