POSITIVE-TYPE RESIST COMPOSITION, AND METHOD FOR PRODUCTION OF MICROLENS

摘要

Disclosed is a positive-type resist composition particularly for forming a microlens or a planarization film having excellent transparency, excellent heat resistance and an excellent refractive index.  Also disclosed are a microlens and a planarization film each of which is formed from the positive-type resist composition. The positive-type resist composition comprises the following components (A), (B) and (C): (A) an alkali-soluble polymer which contains a unit structure having a biphenyl structure; (B) a compound having an organic group which can be photolyzed to produce an alkali-soluble group; and (C) a solvent.  In the positive-type resist composition, the alkali-soluble polymer (A) contains a unit structure represented by formula (1), wherein the content ratio (n1) of the unit structure represented by formula (1) meets the requirement represented by the following formula: 0.3=n1=1.0 when the total number of unit structures constituting the polymer (A) is taken as 1.0.