发明名称 SURFACE PROCESSING METHOD AND SURFACE PROCESSING APPARATUS
摘要 A processing object 2 is sucked and fixed by a sucker 11 and rotated by a rotator 12. In that state, a processing liquid supplied from a processing liquid supply 22 is applied through a processing liquid application tube 21 onto a surface of the processing object 2. Thermal electrons emitted from a thermionic source 33 are accelerated by an acceleration electrode 34 and pass through a Be film 32 to impinge upon the processing liquid on the surface of the processing object 2. When the processing liquid on the surface of the processing object is irradiated with the electron beam, the processing liquid is ionized or radicalized to become active, thereby effectively processing the surface of the processing object 2.
申请公布号 US2010015810(A1) 申请公布日期 2010.01.21
申请号 US20070438773 申请日期 2007.06.22
申请人 HAMAMATSU PHOTONICS K.K. 发明人 YANAGISAWA YUTARO;FUJITA KATSUYOSHI
分类号 H01L21/306 主分类号 H01L21/306
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