X-RAY REFLECTING MIRROR, X-RAY REFLECTING APPARATUS AND X-RAY REFLECTOR USING THE X-RAY REFLECTING MIRROR, AND METHOD FOR PREPARING X-RAY REFLECTING MIRROR

摘要

Disclosed is, for example, an X-ray reflecting mirror that has a reflecting surface having a high smoothness and high and stable imaging (reflective) properties and has a reduced entire mirror weight. An X-ray reflecting mirror with a reflecting surface having a stable curved surface shape can be provided by thermoplastically deforming a silicon substrate.  A silicon wafer can be freely deformed into a desired shape by applying a pressure to the silicon wafer at an elevated temperature of about 1300 degrees in a hydrogen atmosphere.  When the substrate is subjected to hydrogen annealing to further reduce the roughness of the surface of silicon, whereby the reflectance can be improved.