| 摘要 |
PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint, which has efficient curability and excellent stability in storage with a lapse of time, especially excellent stability in storage with a lapse of time in a viewpoint of suppressing reduction in pattern accuracy after curing. SOLUTION: The curable composition for nanoimprint contains a polymerizable monomer (A), a photopolymerization initiator (B) and a polymerization inhibitor (C), wherein, an additive amount of the polymerization inhibitor is 300 ppm to 5% in the weight of the polymerizable monomer. COPYRIGHT: (C)2010,JPO&INPIT |
