| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implantation apparatus capable of both preventing wafer falling and suppressing pin marks. SOLUTION: The ion implantation apparatus includes a holding means 10 holding a wafer W and turning it along its circumference, holds the wafer W at a predetermined position, and carries out ion implantation to the wafer W in regions overlapping a portion of its circumference. The holding means 10 turns and inclines the wafer W and also holds the wafer W by three or more holding pins 20. The holding pin 20 contains a resin material as a forming material and its side face has an inversely tapered shape. The multiple holding pins 20 include a first holding pin 20A whose protrusion amount is relatively small and a second holding pin 20B whose protrusion amount is relatively large, and the holding pin 20 which is on the upper side from the center of the wafer W in the planar direction of the inclined wafer W is the second holding pin 20B. The angle of inclination of the side face of the second holding pin 20B at a position where ions are implanted into the wafer W is equal to or less than an angle of incidence of an ion beam IB relative to the wafer W. COPYRIGHT: (C)2010,JPO&INPIT
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