| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that suppresses the degradation of throughput. <P>SOLUTION: The exposure apparatus includes: an optical member which emits exposure light; first and second holding units which hold a substrate; and first and second members which have first and second surfaces disposed at least partially at peripheries of the first and second holding units and can move on a predetermined surface while holding the substrate. The first and second surfaces have first and second edges, and at least one short region of the substrate held by the first and second holding units is exposed while the first and second members are moved to the optical member in first and second directions which are neither parallel nor perpendicular to the first and second edges. The first and second members are moved during transition from a first state where the optical member and first surface face each other to a second state where the optical member and second surface face each other so as to maintain a state where the first and second edges are put close to each other or in contact with each other. <P>COPYRIGHT: (C)2010,JPO&INPIT |
