MEASURING METHOD, MEASURING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, MANUFACTURING METHOD OF DEVICE AND DESIGN METHOD

摘要

PROBLEM TO BE SOLVED: To provide a measuring method capable of highly accurately measuring a flare in a wide range including a flare with a long scattering distance (a flare with a scattering distance of about one to several hundreds of μm) while reducing the increase of a measurement load.

SOLUTION: The measuring method for measuring the flare generated in an optical system to be measured includes: a first measuring step of measuring the wavefront aberration of the optical system to be measured on a measurement surface; a second measuring step of measuring a pupil transmittance distribution of the optical system to be measured on the measurement surface; a determination step of determining a pupil function of the optical system to be measured based on the wavefront aberration measured in the first measuring step and the pupil transmittance distribution measured in the second measuring step; and a calculating step of performing imaging computation using the pupil function of the optical system to be measured determined in the determination step to obtain a light intensity distribution formed on an image plane of the optical system to be measured, and calculating a flare generated in the optical system to be measured from the light intensity distribution.

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