发明名称 SUBSTRATE INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To unite an elevation mechanism and a positioning mechanism, miniaturize a driving mechanism, provide a driving motor together with the elevation mechanism and the positioning mechanism in a vacuum chamber, and eliminate a sealing mechanism. SOLUTION: The substrate inspection apparatus is used to inspect a substrate in a vacuum chamber. The vacuum chamber includes a Z stage for supporting a substrate, a stage elevation mechanism for elevating the Z stage in Z-axis direction and an inspection mechanism for inspecting a substrate to be placed on the Z stage. The stage elevation mechanism includes an elevation cam which has a contact surface different in contact position in the Z axis direction to the horizontal-direction position, an elevation roller which is brought into contact with the contact surface of the elevation cam while it is being rotated, and a driving mechanism for moving the elevation roller or the elevation cam in the horizontal direction. When the driving mechanism is driven, the elevation roller or the elevation cam is relatively moved in the horizontal direction, and the movement in the horizontal direction relatively moves the elevation roller or the elevation cam in the Z-axis direction. Finally, the movement in the Z-axis direction elevates the Z stage. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010016066(A) 申请公布日期 2010.01.21
申请号 JP20080172767 申请日期 2008.07.01
申请人 SHIMADZU CORP 发明人 TANAKA TAKESHI
分类号 H01L21/68;G01N23/225;G01R31/00;G02F1/13 主分类号 H01L21/68
代理机构 代理人
主权项
地址