发明名称 Nonvolatile Memory Device and Fabrication Method Thereof
摘要 A nonvolatile memory device and a method for its fabrication may ensure uniform operating characteristics of ReRAM. The ReRam may include a laminated resistance layer that determines phase of ReRAM on an upper edge of a lower electrode for obtaining a stable threshold drive voltage level.
申请公布号 US2010015758(A1) 申请公布日期 2010.01.21
申请号 US20090567682 申请日期 2009.09.25
申请人 HYNIX SIMICONDUCTOR INC. 发明人 KIM TAE HOON
分类号 H01L21/28 主分类号 H01L21/28
代理机构 代理人
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