SOURCE MODULE OF AN EUV LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE

摘要

A source module (10) for use in a lithographic apparatus is constructed to generate extreme ultra violet (EUV) and secondary radiation, and includes a buffer gas configured to cooperate with a source of the EUV radiation. The buffer gas has at least 50% transmission for the EUV radiation and at least 70% absorption for the secondary radiation.