| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an efficient feed forward compensation mechanism for compensating pressure pulses caused by movements of an object of a device in relation to a metrology frame. <P>SOLUTION: A lithographic apparatus including: a projection system; a metrology frame MF supported by a vibration isolation support device ISD; a movable object WT; and a displacement determining unit to determine positions, speeds and/or accelerations of the object WT in relation to the metrology frame MF and/or a projection system. At least one actuator F is provided for applying correcting forces and/or torques on the metrology frame MF, and a controller C is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame MF on the basis of the determined positions, speeds and/or accelerations of the object WT in order to compensate pressure pulses exerted on the metrology frame MF caused by movements of the object WT in relation to the metrology frame MF. <P>COPYRIGHT: (C)2010,JPO&INPIT |
