| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of providing information exhibiting a surface condition of an optical element constituting an illumination optical system of the exposure apparatus, and having a simple structure. <P>SOLUTION: This exposure apparatus is used for exposing a substrate 51 by projecting a pattern of a reticle on the substrate 51 by a projection optical system 1, and includes: the illumination optical system 21 including an imaging illumination optical system 212 having an optical element 201; a reflecting surface 301 which reflects light toward the optical element 201; and a processing part P which provides information exhibiting the surface condition of the optical element 201 based on first light which is incident on the imaging illumination optical system 212 and reflected by the reflecting surface 301 and a surface of the optical element 201, and second light which is incident on the imaging illumination optical system 212, and is not reflected by the reflecting surface 301 and the surface of the optical element 201. <P>COPYRIGHT: (C)2010,JPO&INPIT |
