| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for producing an original master used to produce a mold structure, wherein variance between convex patterns is suppressed. <P>SOLUTION: The method for producing an original master used to produce a mold structure includes: forming a resist layer on a surface of an original master substrate, and exposing and developing the resist layer so as to form on the surface of the substrate an original master resist pattern substantially in the shape of concentric arcs utilized to form an original master concavo-convex pattern; selectively etching the resist pattern under one of a condition that the resist pattern on an inner circumferential side is etched to a greater extent than the resist pattern on an outer circumferential side and a condition that the resist pattern on the outer circumferential side is etched to a greater extent than the resist pattern on the inner circumferential side; and etching the substrate with the selectively etched resist pattern serving as a mask so as to form the original master concavo-convex pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
