发明名称 CHEMICAL SUBSTANCE MONITORING DEVICE AND CHEMICAL SUBSTANCE MONITORING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a chemical substance monitoring device and a chemical substance monitoring method, capable of performing high-accuracy analysis. Ž<P>SOLUTION: The device has an ion source part 3 for generating ions of a substance to be measured in a sample gas, introduction piping 2 for introducing the sample gas into the ion source part, a mass spectrometry part 4 for performing mass spectrometry on the ions, and piping for introducing dry air for diluting the sample gas into the introduction piping. Dry air is introduced into the introduction piping so that the moisture concentration in the sample gas introduced into the ion source part may reach approximately 1% or less, and detection of the substance to be measured is performed. According to the invention, sensitivity reduction due to moisture can be prevented, by controlling the moisture concentration, and quantitative determination accuracy can be improved. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010014727(A) 申请公布日期 2010.01.21
申请号 JP20090218411 申请日期 2009.09.24
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KAN MASAO;YAMADA MASUYOSHI;WAKE IZUMI
分类号 G01N27/62 主分类号 G01N27/62
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