| 摘要 |
A vapor deposition apparatus capable of forming an organic thin film having a good film quality is provided. The vapor deposition apparatus of the present invention possesses an evaporating chamber and a vapor deposition case; and the vapor deposition case is connected with the evaporating chamber by a small hole. Since a vapor deposition material is fed into the evaporating chamber based on an amount necessary for each substrate, a large amount of the vapor deposition material is not heated for a long time period. Since the vapor deposition material is evaporated in the evaporating chamber, no liquid drops reach a substrate even during bumping. When the vapor deposition material is evaporated by irradiation with a laser beam, the vapor deposition material can be less chemically denatured.
|
