发明名称 PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD
摘要 <p>A pattern forming apparatus brings a masking panel (20) having a pattern-like through hole (22) into tight contact with the inside surface of a front panel (10), and positions the through hole (22) to the inside of a recess (15) of the front panel (10). In this state, liquid developer is supplied through a developing roller (34), and an electric field passing through a developing recess (82) where the recess (15) and through hole (22) are continued. Therefore, charged developer particles are collected in the developing recess (82), and the recess (15) of the front panel (10) is developed.</p>
申请公布号 EP2145770(A1) 申请公布日期 2010.01.20
申请号 EP20080710623 申请日期 2008.01.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KAWAMURA, NOBUO;ONODERA, MAKOTO;HIRAHARA, SACHIKO;IOI, TOSHIO;ISHII, KOICHI
分类号 B41M1/42;B41M1/12;G09F9/00;H01J9/227 主分类号 B41M1/42
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