发明名称 |
A METHOD AND A DEVICE FOR DETERMINING THE END POINT OF A CLEANING OPERATION OF A CVD APPARATUS |
摘要 |
<p>A method of determining an end point for a remote microwave plasma cleaning system. In one embodiment, the method comprises several steps. The first step is to expose an electrical device to a deposition operation. Next, the electrical device is exposed to a plasma cleaning operation. In the following step, a value for a performance characteristic of the electrical device is measured. In the last step, an amount of cleaning performed on the electrical device is calculated based on a relationship between a baseline value of the performance characteristic and on the measured value of the performance characteristic of the electrical device.</p> |
申请公布号 |
EP1274877(B1) |
申请公布日期 |
2010.01.20 |
申请号 |
EP20010924567 |
申请日期 |
2001.03.29 |
申请人 |
PHILIPS SEMICONDUCTORS INC.;NXP B.V. |
发明人 |
ANNAPRAGADA, RAO, VENKATESWARA |
分类号 |
C23C16/44;B08B5/00;B08B9/00;C23C16/52;H01J37/32;H01L21/205 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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