发明名称 Wiring substrate, semiconductor device, and method of manufacturing the same
摘要 A wiring substrate includes a base insulating film, a first interconnection formed on a top surface side of the base insulating film, a via conductor provided in a via formed in the base insulating film, and a second interconnection provided on a bottom surface side of the base insulating film. The second interconnection is connected to the first interconnection via the via. The wiring substrate includes divided-substrate-unit regions, in each of which the first interconnection, the via, and the second interconnection are formed. The wiring substrate includes a warpage-controlling pattern on the base insulating film, with a warped shape such that when the wiring substrate rests on a horizontal plate, at least a central part of a plane surface of the substrate contacts the horizontal plate, with both ends of the side raised.
申请公布号 US7649749(B2) 申请公布日期 2010.01.19
申请号 US20070822599 申请日期 2007.07.09
申请人 NEC ELECTRONICS CORPORATION;NEC CORPORATION 发明人 TSUKANO JUN;OGAWA KENTA;MAEDA TAKEHIKO;YAMAMICHI SHINTARO;KIKUCHI KATSUMI
分类号 H05K1/11;H05K1/14 主分类号 H05K1/11
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