发明名称 Charged particle beam equipment with magnification correction
摘要 Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of displacement, if any, in rotation direction between the direction of a periodic structure pattern of a sample having a known periodic structure and the X or Y direction on an electron image of the sample. The charged particle beam equipment of the invention enables the simultaneous measurement of magnification errors in the X and Y directions by FFT transformation and coordinate transformation of an electron image, even when there is a displacement in rotation direction between the direction of the periodic structural pattern and the X or Y direction on the electron image of the sample.
申请公布号 US7649172(B2) 申请公布日期 2010.01.19
申请号 US20070798770 申请日期 2007.05.16
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 OZAWA MASARU;INADA HIROMI;TERAUCHI DAISUKE;TANAKA HIROYUKI
分类号 H01J37/26 主分类号 H01J37/26
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