发明名称 |
Process for preparing fluorine-containing norbornene derivative |
摘要 |
There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.
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申请公布号 |
US7649118(B2) |
申请公布日期 |
2010.01.19 |
申请号 |
US20070649265 |
申请日期 |
2007.01.04 |
申请人 |
DAIKIN INDUSTRIES, LTD. |
发明人 |
ARAKI TAKAYUKI;ISHIKAWA TAKUJI;KUME TAKUJI;YAMAMOTO AKINORI |
分类号 |
C07C45/00;C07C33/44;C07C43/313;C07C45/45;C07C49/567;C07C61/28;C07C69/96;G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
C07C45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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