发明名称 MANUFACTURING METHOD OF QUANTUM WELL STRUCTURE
摘要 PURPOSE: A manufacturing method of a quantum well structure is provided to implement light emitting characteristics due to indium composition by suppressing the decomposition of a crystalline structure. CONSTITUTION: The temperature of a substrate(15) is kept at a first temperature. A well layer(5a) is grown up. The temperature of the substrate is increased from the first temperature. An intermediate layer(5c) is grown up on the well layer. The intermediate layer includes group III nitride semiconductor. The group III nitride semiconductor has a band gap energy higher than that of the well band gap energy. The temperature of substrate is kept at the second temperature higher than a first temperature.
申请公布号 KR20100006547(A) 申请公布日期 2010.01.19
申请号 KR20090062097 申请日期 2009.07.08
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 AKITA KATSUSHI;SUMITOMO TAKAMICHI;ENYA YOHEI;KYONO TAKASHI;UENO MASAKI
分类号 H01L33/04 主分类号 H01L33/04
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