| 摘要 |
The invention is directed to an arrangement for generating extreme ultraviolet (EUV) radiation based on a plasma that is generated by electric discharge. It is the object of the invention to provide a novel possibility for radiation sources based on an electric discharge by which a long lifetime of the electrodes that are employed and the largest possible solid angle for bundling the radiation emitted from the plasma are achieved. According to the invention, this object is met by providing coated electrodes in the form of two endless strip electrodes which circulate over guide rollers and which have at a short distance between them an area in which the electric discharge takes place. The coating is at least partially sacrificed through excitation by an energy beam and generation of plasma, and means for driving each strip electrode are arranged in such a way that during a revolution the strip electrodes, after immersion in a molten metal, are guided through a wiper for generating a defined thickness of coating material, are directed in a vacuum chamber to a location where the desired generation of plasma takes place, and are guided back into the molten metal after the electric discharge in order to regenerate the coating and to make electric contact between the electrodes and a pulsed high-voltage source.
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