发明名称 Optical apparatus, photomask inspecting apparatus, and exposure apparatus
摘要 An optical apparatus includes a laser light source for emitting a beam of light, an integrator for dividing the beam of light into plural beams of light, and a light focusing optical system for focusing the beams of light passed through the integrator. The optical apparatus also includes a stage, on which the light concentrated by the light focusing optical system is irradiated and on which an object may be placed, and includes a projecting optical system for projecting the light transmitted through the object. The following conditions satisfy the following numerical formula (1). The projecting optical system has a visual field including an effective visual field, and the integrator has a division number N corresponding to a predetermined direction in a predetermined effective visual field. A ghost image is formed in the effective visual field in the predetermined direction and has contrast gamma. The light focusing optical system has numerical aperture NA1, the projecting optical system has numerical aperture NA2, and (NA1/NA2) defines a coherence factor sigma. The object has a light blocking portion with an amplitude transmittance T. N >= sigma pi ⁢ 8 pi ⁢ ⁢ C 2 3 ⁢ ( C = gamma / T ) ( 1 )
申请公布号 US7649625(B2) 申请公布日期 2010.01.19
申请号 US20090412825 申请日期 2009.03.27
申请人 KABUSHIKI KAISHA TOPCON 发明人 TAKADA AKIRA
分类号 G01N21/00;G01B11/24;G01N21/956;G02B13/24;G03B27/54;G03F1/84;H01L21/027 主分类号 G01N21/00
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