发明名称 Hard films and sputtering targets for the deposition thereof
摘要 For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein "a" and "x" are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05<=a<=0.4 and 0<=x<=1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Mo; and "a", "b", and "x" are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0<=1-a-b, 0<=a, 0.03<=b<=0.35, and 0<=x<=1.
申请公布号 US7648781(B2) 申请公布日期 2010.01.19
申请号 US20090392655 申请日期 2009.02.25
申请人 KOBE STEEL, LTD. 发明人 YAMAMOTO KENJI;FOX-RABINOVICH GERMAN
分类号 B32B9/00 主分类号 B32B9/00
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