| 发明名称 |
A source module of an EUV lithographic apparatus, a lithographic apparatus, and a method for manufacturing a device. |
| 摘要 |
A source module for use in a lithographic apparatus is constructed to generate extreme ultra violet (EUV) and secondary radiation, and includes a buffer gas configured to cooperate with a source of the EUV radiation. The buffer gas has at least 50% transmission for the EUV radiation and at least 70% absorption for the secondary radiation. |
| 申请公布号 |
NL2003181(A1) |
申请公布日期 |
2010.01.18 |
| 申请号 |
NL20092003181 |
申请日期 |
2009.07.10 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MAARTEN VAN HERPEN;WOUTER SOER;ANDREY YAKUNIN |
| 分类号 |
G21K1/02;G02B5/20;G03F7/20;H05G2/00 |
主分类号 |
G21K1/02 |
| 代理机构 |
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