| 摘要 |
Processes are claimed for producing an electrical circuit substrate by applying first and second metallisations (3, 4) onto both sides of a ceramic layer (2), the first metallisation (3) being a copper foil applied by a DCB (direct copper bond) technique. In one process, a substrate (1b) with a through-contact (10) is produced by providing an opening (11) in the ceramic layer and applying the second metallisation (4) as a metal-containing paste by a thick film or thin film technique such that the paste is also applied onto the opening (11) and a first metallisation area exposed in the opening. In another process, in which a metallic interlayer is to be formed for thermal and/or electrical connection of the substrate (1a) to another component (e.g. a metal base plate, 6), the second metallisation (4) is much thinner than the first metallisation (3) and is applied as a metal-containing paste by a thick film or thin film technique. Also claimed is a substrate produced by one of the above processes. |
