METHOD OF CREATING MASK PATTERN DATA AND METHOD FOR MANUFACTURING MASK

摘要

PROBLEM TO BE SOLVED: To provide a method of creating a mask pattern facilitating formation of a fine pattern with high accuracy in a lithographic process using a reflective optical system.

SOLUTION: The method of creating the mask pattern for a device pattern to be formed in a mask 1 for reflective exposure includes a step of generating the data of a mask pattern 6 based on a position correction amount table for correcting a misalignment amount of a transfer position upon transferring the mask pattern 6 onto an exposure object 7 caused associating with at least either a pattern dimension or a pattern pitch of the mask pattern 6.

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