| 摘要 |
1,259,803. Semi-conductor devices; resistors. WESTERN ELECTRIC CO. Inc. 29 Jan., 1969 [5 Feb., 1968], No. 4861/69. Headings H1K and H1S. During semi-conductor device manufacture at least one N(P) type zone 42, 43 is diffused into the surface of a P(N) type substrate 41 and a P(N) type epitaxial layer is deposited thereon. N-type contact zones 46, 48 are then diffused through the epitaxial layer to meet the now buried N-type zones 42, 43 around their entire peripheries, and a P-type dopant is diffused non-selectively into the entire surface of the epitaxial layer, the P-type doping level being selected so as not to convert the surface of the N-type contact zones 46, 48 to P-type conductivity. Further selective N-type diffusion into the zones 46, 48 may be employed to offset the compensation produced therein by the non- selective P-type diffusion. In the P-type islands surrounded by the buried zones 42, 43 and the contact zones 46, 48 devices such as bipolar or field effect transistors, diodes, resistors or capacitors may be formed, using selective diffusion where necessary. With silicon as the semi-conductor material suitable dopants mentioned are boron, arsenic, antimony or phosphorus.
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