| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a copolymer which is a material for forming an upper layer film for immersion exposure less liable to develop a water mark defect and a dissolution residue defect. <P>SOLUTION: The method for producing a copolymer includes: obtaining a polymer solution by conducting a polymerization reaction while dropping a first monomer solution containing a predetermined monomer (A), and a radical polymerization initiator into a solvent heated to a temperature at which polymerization is possible; and obtaining a copolymer solution containing a copolymer used as a material for forming an upper layer film for immersion exposure by dropping a second monomer solution containing a monomer (B) having an acidic functional group into the obtained polymer solution. <P>COPYRIGHT: (C)2010,JPO&INPIT |
