| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of efficiently removing the mist of a processing solution from around a substrate. SOLUTION: An exhaust tub 30 of a cylinder form with a bottom contains: a first cup 31 and a second cup 32, which are fixed in the exhaust tub 30; and a first guard 33, a second guard 34, a third guard 35 and a fourth guard 36, which can move up and down independently. When a second opening for recovery 93 is formed facing the periphery of a wafer W, a third exhaust route P3 is formed in the exhaust tub 30 from the second opening for recovery 93 between the upper end part 63b and the upper end part 35b, between the lower end part 35a of the third guard 35 and an outside recovery trough 68 and through inside of the exhaust tub 30 to the exhaust opening 37. COPYRIGHT: (C)2010,JPO&INPIT
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