| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving flatness of an object to be polished while preventing occurrence of polishing flaws and improving a polishing rate even if polishing particles cannot enter inside through a polishing surface. <P>SOLUTION: The polishing pad 10 comprises a urethane sheet 2 formed of polyurethane resin. The urethane sheet 2 has the polishing surface P for polishing an object to be polished. The urethane sheet 2 has no opening through which abrasive grains can pass formed on the polishing surface P so that the abrasive grains cannot enter inside the urethane sheet 2 through the polishing surface P. A hysteresis loss ratio of the urethane sheet 2 is specified in a range of 5-40%. Even if the polishing surface P of the urethane sheet 2 is deformed by the abrasive grains in a polishing liquid during the polishing, its deformation can be restored in a short period of time, making the abrasive grains easy to move. <P>COPYRIGHT: (C)2010,JPO&INPIT |
