| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical interferometer capable of being positioned only by moving an interference optical system, and rapidly and accurately measuring the thickness of a film, and to provide a film thickness measuring method using the same. Ž<P>SOLUTION: Light flux emitted from a narrow-wavelength band light source 11 with a narrow wavelength spectrum enters a light flux branching/synthesis means 31 through a light flux branching means 20. Light flux in a reference light path 30 is reflected by a reference mirror 34 to enter the light flux branching/synthesis means 31. Light flux branched in a measurement light path 50 is reflected by a face of a test object 60 to enter the light flux branching/synthesis means 31. The light flux branching/synthesis means 31 synthesizes the light flux in the reference light path 30 and the light flux in the measurement light path 50. The synthesized light flux enters a photoelectric conversion means 70 through the light flux branching means 20. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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