发明名称 |
SAMPLE WAFER FOR CALIBRATION OF IMAGE INSPECTION DEVICE, AND CALIBRATION METHOD OF IMAGE INSPECTION DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a sample wafer for calibration that is used for calibration of an image inspection device performed for keeping the inspection accuracy of pinhole inspection and efficiently performs the calibration by providing a hard laser mark on a surface. SOLUTION: This sample wafer for calibration is used for calibration of the image inspection device for inspecting a pinhole defect of a silicon wafer by image processing. The hard laser mark is provided on the surface of the sample wafer for calibration. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010008336(A) |
申请公布日期 |
2010.01.14 |
申请号 |
JP20080170491 |
申请日期 |
2008.06.30 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
YOSHIDA YASUSHI;SATO MASAKAZU |
分类号 |
G01N21/93;G01N21/894;G01N21/956;H01L21/66 |
主分类号 |
G01N21/93 |
代理机构 |
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