| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition having high dispersibility of a pigment and high developability with an alkali developer and further having high chemical resistance of a cured film, and a pigment dispersion composition and a pigment dispersant for preparing the photoresist. <P>SOLUTION: The pigment dispersant is a polyurethane resin including (A1) one or two of an acidic functional group and a neutralized salt group of the acidic functional group, (A2) one or more of a basic functional group, a neutralized salt group of the basic functional group and a nonionic polar molecular chain, (B) a low-polarity molecular chain, and (C) an active energy ray-curable unsaturated group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
