| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of patterning a member in a substrate layer by exposing a photoresist layer more than twice. <P>SOLUTION: A carbonaceous mask layer is deposited (210), and thereafter a photoresist layer and an intermediate layer are deposited on the carbonaceous layer in an operation (215). Reticles are aligned on the substrate layer (225), a photoresist is subjected to a first exposure (230), and a first pair of photoresist lines are formed. The alignment between the substrate layer and the reticles are offset by a predetermined amount (235), the photoresist is subjected to a second exposure (240), and at least one of the photoresist lines printed by the first exposure is branched. The secondly-exposed photoresist is then developed (245). By the double pattern formed on the photoresist layer, the carbonaceous mask layer and another optional non-photosensitive intermediate layer are patterned (250). <P>COPYRIGHT: (C)2010,JPO&INPIT |
