| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the deterioration of an O-ring caused by radiant heating in a vacuum heating apparatus, and perform heating treatment to a substrate with good annealing characteristics. Ž<P>SOLUTION: A vacuum heating apparatus is provided with: a vacuum container 2 with bonded flanges 11 and 12 having an opening part 9; a turbo molecular pump 17 for exhausting the vacuum container 2; and a heater base 3 for heating the substrate 5 mounted in the vacuum container 2. A joint surface between the flanges 11 and 12 is sealed by the O-ring 10. Moreover, level differences 13 fitting into each other are formed at the part between the heater base 3 and the O-ring 10 among the joint surface between the flanges 11 and 12. Thereby, there is a structure in which light does not reach through the joint surface between the flanges 11 and 12 to the radiant heat from the heater base 3. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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