发明名称 SPUTTERING SYSTEM AND METHOD FOR DEPOSITING THIN FILM
摘要 A sputtering system for depositing a thin film on the surface of a disc substrate in which high precision positioning of an inner mask and an outer mask is facilitated. The sputtering system has a mask member placed on the surface of the substrate mounted on a substrate holder to cover a partial region on the surface of the substrate. A thin film is deposited by sputtering in a region on the surface of the substrate not covered by the mask member. A section for carrying in and carrying out the substrate has mechanically holds and releases the substrate holder mounting the substrate, and mechanically holds and releases the mask member.
申请公布号 US2010006422(A1) 申请公布日期 2010.01.14
申请号 US20060294294 申请日期 2006.03.28
申请人 YOKOO MASAYOSHI;TANIKAWA ISAO;KAINUMA NORIKAZU;TAKANO YOSHINOBU 发明人 YOKOO MASAYOSHI;TANIKAWA ISAO;KAINUMA NORIKAZU;TAKANO YOSHINOBU
分类号 C23C14/34 主分类号 C23C14/34
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