发明名称 |
SPUTTERING SYSTEM AND METHOD FOR DEPOSITING THIN FILM |
摘要 |
A sputtering system for depositing a thin film on the surface of a disc substrate in which high precision positioning of an inner mask and an outer mask is facilitated. The sputtering system has a mask member placed on the surface of the substrate mounted on a substrate holder to cover a partial region on the surface of the substrate. A thin film is deposited by sputtering in a region on the surface of the substrate not covered by the mask member. A section for carrying in and carrying out the substrate has mechanically holds and releases the substrate holder mounting the substrate, and mechanically holds and releases the mask member.
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申请公布号 |
US2010006422(A1) |
申请公布日期 |
2010.01.14 |
申请号 |
US20060294294 |
申请日期 |
2006.03.28 |
申请人 |
YOKOO MASAYOSHI;TANIKAWA ISAO;KAINUMA NORIKAZU;TAKANO YOSHINOBU |
发明人 |
YOKOO MASAYOSHI;TANIKAWA ISAO;KAINUMA NORIKAZU;TAKANO YOSHINOBU |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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