VACUUM TREATMENT APPARATUS

摘要

<P>PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which has high productivity per installation area. Ž<P>SOLUTION: The vacuum treatment apparatus includes: a plurality of vacuum treatment containers each having a treatment chamber in which the pressure is reduced; a vacuum conveyance container around which those vacuum treatment containers are arranged while coupled and in which samples to be treated is conveyed in a state where the internal pressure is reduced; an atmosphere conveyance container where a plurality of cassette bases which are coupled to the front side of the vacuum conveyance container and mounted with cassettes containing the samples on the front side are arranged to convey the samples inside under atmospheric pressure; a positioning machine disposed at one of right and left ends in the atmosphere conveyance container and adjusting the positions of the samples; and a regulator disposed on a floor surface below the positioning machine and regulating supply of a fluid supplied to the plurality of treatment containers. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž