发明名称 BEAM EXPOSURE APPARATUS AND DRAWING CONTROL CIRCUIT OF BEAM EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a beam exposure apparatus using a translatory stage and a spindle rotation mechanism, in which a circular arc pattern is transferred by exposure onto a master, with a simple and inexpensive circuit configuration. Ž<P>SOLUTION: The exposure apparatus includes circuits (80, 82, 84) generating a spindle clock, a write clock and a stage clock by a DDS (Direct Digital Synthesizer), a trigger generating circuit (87) generating a trigger signal indicating a specified drawing position about once per one rotation from the write clock, a measuring circuit (88) measuring the position in the radial and circumference directions where the trigger is generated, and a frequency data setting circuit (89) adjusting the clock frequency based on the measurement result. Thus, arrayed pits in a circular arc such as a servo pattern of a magnetic disk medium or the like can be obtained by a simple circuit. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010008833(A) 申请公布日期 2010.01.14
申请号 JP20080169864 申请日期 2008.06.30
申请人 FUJITSU LTD 发明人 OZAWA YASUYUKI;IZUMI HARUHIKO
分类号 G03F7/20;G11B5/84;G11B5/855;G11B7/26;H01L21/027 主分类号 G03F7/20
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