| 摘要 |
<p>The invention relates to an illumination system for a projection exposure apparatus for semiconductor lithography, comprising a light source for generating a beam bundle and optical elements for conditioning the beam bundle, and comprising a beam shaping unit for setting different angular orientations of different partial beams of the beam bundle. In this case, the beam shaping unit has a micromirror array having a plurality of micromirrors that are arranged on a carrier element and can be tilted about a zero position, and the beam shaping unit is embodied in such a way that given a zero position of all the micromirrors at least two micromirrors are present for which partial beams that are reflected at the same angle relative to the surface of the two micromirrors leave the beam shaping unit in different directions. In addition, the invention relates to a projection exposure apparatus equipped with the corresponding illumination system.</p> |
