| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment in which the possibility of the formation of bubbles in, for example, a recessed portion is reduced and is desirably minimized substantially. <P>SOLUTION: A substrate table is configured and disposed to hold a substrate having an edge feature. A projection system is configured to project a radiation beam with a pattern onto the substrate. A fluid treatment system is configured and disposed to supply a flow of liquid into a space between the projection system and the substrate table and retain at least a part of the liquid in a space. A positioner is configured to position the substrate on the substrate table such that the edge feature is located downstream of the substrate in the flow of liquid. <P>COPYRIGHT: (C)2010,JPO&INPIT |
