发明名称 DEVICE INCLUDING AN IMIDE LAYER WITH NON-CONTACT OPENINGS AND METHOD
摘要 A device including an imide layer with non-contact openings and the method for producing the device. One embodiment provides a substrate on a main surface of the substrate, an imide layer on the metallization layer, at least one contact opening through the imide layer and a plurality of non-contact openings in the imide layer. The non-contact openings are dimensioned to provide for an increased surface area of the imide layer or a surface area of the imide layer which is not reduced by more than 10 percent.
申请公布号 US2010007028(A1) 申请公布日期 2010.01.14
申请号 US20080171799 申请日期 2008.07.11
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 FACHMANN CHRISTIAN;UNGERMANNS CHRISTOPH;GAMERITH STEFAN;FUCHS MICHAEL
分类号 H01L23/48;B05D5/12;B32B3/24;G03F7/20;H01L21/44 主分类号 H01L23/48
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