发明名称 |
DEVICE INCLUDING AN IMIDE LAYER WITH NON-CONTACT OPENINGS AND METHOD |
摘要 |
A device including an imide layer with non-contact openings and the method for producing the device. One embodiment provides a substrate on a main surface of the substrate, an imide layer on the metallization layer, at least one contact opening through the imide layer and a plurality of non-contact openings in the imide layer. The non-contact openings are dimensioned to provide for an increased surface area of the imide layer or a surface area of the imide layer which is not reduced by more than 10 percent. |
申请公布号 |
US2010007028(A1) |
申请公布日期 |
2010.01.14 |
申请号 |
US20080171799 |
申请日期 |
2008.07.11 |
申请人 |
INFINEON TECHNOLOGIES AUSTRIA AG |
发明人 |
FACHMANN CHRISTIAN;UNGERMANNS CHRISTOPH;GAMERITH STEFAN;FUCHS MICHAEL |
分类号 |
H01L23/48;B05D5/12;B32B3/24;G03F7/20;H01L21/44 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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