| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition. <P>SOLUTION: The resist composition contains a base component (A) of which the solubility in an alkali developer changes by the action of an acid and an acid generator component (B) which generates an acid upon exposure to light, wherein the acid generator component (B) contains an acid generator (B1) comprising a compound represented by a general formula (b1-1) wherein Y<SP>11</SP>is 1-4C fluorinated alkyl; Y<SP>12</SP>is 1-4C fluorinated alkylene; Y<SP>13</SP>is a single bond or a divalent linking group, X<SP>10</SP>is a 3-30C cyclic hydrocarbon group, and A<SP>+</SP>is an organic cation. <P>COPYRIGHT: (C)2010,JPO&INPIT |
